Kamran AbbasiThe article is available free ofSee accompanying PDFContact:.EWL-omputer chip lithography process designed at RITA new computer chip lithography method under development at Rochester Institute of Technology has conducted imaging capabilities beyond previously thought possible.Leading a team of engineering students, Bruce Smith, RIT developed Professor of Microelectronics and director of the Center for Nanolithography Research in the Kate Gleason College of Engineering, one method – known as evanescent wave lithography, or EWL – capable of imaging optical smallest ever semiconductor device geometry.
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